A model of gravity-induced distribution of material in plasma polymerized aerosols and films
Samara State University of Architecture and Civil Construction, 194 Molodogvardeyskaya St., 443001, Samara, Russia
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Accepted: 3 January 2008
Published online: 20 February 2008
A mathematical model of the volumetric part of plasma polymerization influenced by gravity is presented. Plasma-activated adhesion of monomer molecules to a surface of a germinal particle is assumed as a basic mechanism of particulate growth. The continuity equation for the flow of matter through the discharge has been formulated and solved in two extreme asymptotic approximations --for small and major duration of the process. Several non-equilibrium distribution functions of the polymer were obtained, for instance, an amount of the particles as a function of their size or time of fall. Within the adopted model this function demonstrates a sharp downward increase inside a discharge. In addition it contains such parameters as the free fall acceleration or reaction rate coefficients, variations of which enable control of the discharge and properties of the disperse medium.
PACS: 81.15.Gh Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, etc.) – / 81.20.Rg Aerosols in materials synthesis and processing – / 82.33.Ya Chemistry of MOCVD and other vapor deposition methods –
© EDP Sciences, Società Italiana di Fisica and Springer-Verlag, 2008