Eur. Phys. J. E (2006) 20: 309-315
https://doi.org/10.1140/epje/i2006-10021-5

Regular Article

Self-organization of triblock copolymer patterns obtained by drying and dewetting

¹ Instituto de Fısica de São Carlos, Universidade de São Paulo, C.P. 369, 13560-970, São Carlos, SP, Brazil
² Campus Sorocaba, Universidade Federal de São Carlos, C.P. 3031, 18043-970, Sorocaba, SP, Brazil

^* e-mail: acarvalho@power.ufscar.br

Received: 15 April 2006
Accepted: 30 June 2006
Published online: 25 July 2006

Abstract

Self-organized block copolymer structures derived from dewetting of thin films are becoming important in nanotechnology because of the various spontaneous and regular sub-micrometric surface patterns that may be obtained. Here, we report on the self-organization of a poly(styrene)-b-poly(ethene-co-butene-1)-b-poly(styrene) triblock copolymer during drying of its solution over a mica substrate. Regular submicrometric arrangements with long-range order were formed at critical polymer concentrations, consisting of parallel ribbons and hexagonal arrays of dots (droplets). This variety of highly ordered structures is explained by the interplay between forming mechanisms, mainly due to “fingering instabilities” at the three-phase line of the copolymer solution during drying. The thickness of the structures was “quantized” due to the microphase separation of the block copolymer. The formation of hexagonal patterns may be attributed to Marangoni instability at the liquid film surface prior to dewetting.